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VLSI confab melds explorations of semi process, design issues

Clipped to the Drawing Board by Dave Ellery

MANHASSET, N.Y. — The interdependence between process and design is in full evidence at this year's VLSI Symposia , being held June 17-20 in Honolulu, Hawaii. The Symposium on VLSI Technology straddles the Symposium on VLSI Circuits. This year the conference has two overlap days to provide a combined forum that addresses issues from processes, devices and circuits to system-level design and applications.

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Wednesday 18 June, 2008 05:10 PM

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