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VLSI confab melds explorations of semi process, design issues
Clipped to the Drawing Board by Dave Ellery  
MANHASSET, N.Y. — The interdependence between process and design is in full evidence at this year's VLSI Symposia , being held June 17-20 in Honolulu, Hawaii. The Symposium on VLSI Technology straddles the Symposium on VLSI Circuits. This year the conference has two overlap days to provide a combined forum that addresses issues from processes, devices and circuits to system-level design and applications.
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Powered by JoomlaCommentCopyright (C) 2006 Frantisek Hliva. All rights reserved.Homepage: http://cavo.co.nr/
Wednesday 18 June, 2008 05:10 PM
 
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"A good scientist is a person with original ideas. A good engineer is a person who makes a design that works with as few original ideas as possible" - Freeman Dyson